Twenty observations on etch uniformity on silicon wafers are taken during a qualification experiment for a plasma etcher. The data are as follows:
(a) Construct a 95 percent confidence interval estimate of σ2
(b) Test the hypothesis that σ2 = 1.0. Use α = 0.05. What are your conclusions?
(c) Discuss the normality assumption and its role in this problem.
(d) Check normality by constructing a normal probability plot. What are your conclusions?